Volume 6 Issue 3 June - August 2018
Research Paper
Oleg Semenov *, Lyubov Leskova**,
Svetlana Gerasimova ***, Dmitry Vasiounin****
* Project Leader, NXP Semiconductors,
Moscow, Russia.
**,*** Layout designer, NXP Semiconductors,
Moscow, Russia.
**** Circuit Design Engineer, NXP
Semiconductors, Moscow, Russia.
Semenov, O., Leskova, L., Gerasimova,
S., and Vasiounin, D. (2018). Trends in ESD Protection Design For I/O Libraries
in Advanced CMOS and Finfet Technologies. i-manager’s Journal on
Circuits and Systems, 6(3), 1-8.https://doi.org/10.26634/jcir.6.3.14878
Abstract
This paper
discusses the trends in ESD protection design used in I/O libraries in advanced
CMOS and FinFet technologies. The trends and guidelines are provided
predominantly for low voltage I/O libraries that are commonly used for general
purpose interfaces and industrial low voltage interfaces such as, GPIO, DDR,
LVDS, etc. Additionally, the impact of technology scaling on ESD qualification
targets for CDM stress is considered.
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